ISO 14237:2010 ✓ Most Recent

1727224

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

standard by International Organization for Standardization , 07/15/2010

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ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.

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  1. ISO 14237:2010

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    Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

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  2. ISO 14237:2000


    Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

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Published:

07/15/2010

File Size:

1 file

Same As:

BS ISO 14237:2010

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This product is restricted and cannot be purchased in the following countries Ukraine, Russia, Belarus