ISO 14706:2014 ✓ Most Recent

1882067

Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

standard by International Organization for Standardization , 08/01/2014

Track This

Identical Versions Available

Full Description

ISO 14706:2014 specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The method is applicable to the following: elements of atomic number from 16 (S) to 92 (U); contamination elements with atomic surface densities from 1 × 1010 atoms/cm2 to 1 × 1014 atoms/cm2; contamination elements with atomic surface densities from 5 × 108 atoms/cm2 to 5 × 1012 atoms/cm2 using a VPD (vapour-phase decomposition) specimen preparation method.

See more

Also Bought By Customers

 

Document History

  1. ISO 14706:2014

    👀 currently
    viewing


    Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

    • Most Recent

  2. ISO 14706:2000


    Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

    • Historical Version

Order Options

Delivery Options
Price: $172.00
Available for Immediate Download

Product Details

Published:

08/01/2014

Number of Pages:

32

File Size:

1 file

Same As:

BS ISO 14706:2014

Note:

This product is restricted and cannot be purchased in the following countries Ukraine, Russia, Belarus