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  1. Home
  2. ISO/TR 15969:2021

ISO/TR 15969:2021 ✓ Most Recent

2215039  Preview

Surface chemical analysis - Depth profiling - Measurement of sputtered depth

standard by International Organization for Standardization (Technical Report) , 03/01/2021

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Full Description

ISO/TR 15969:2021 provides guidelines for measuring the sputtered depth in sputtered depth profiling. The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm. See more

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Document History

  1. ISO/TR 15969:2021

    You are currently viewing this product 👀 currently
    viewing

    March 2021
    Surface chemical analysis - Depth profiling - Measurement of sputtered depth

    • Most Recent  Most Recent
  2. ISO/TR 15969:2001

    June 2001
    Surface chemical analysis - Depth profiling - Measurement of sputtered depth

    • Historical Version

Browse related products from International Organization for Standardization (Technical Report)

  • International Organization for Standardization > By ICS Code > 71: Chemical technology > 71.040: Analytical chemistry > 71.040.40: Chemical analysis
  • International Organization for Standardization > By Technical Committee > TC 201: Surface chemical analysis > TC 201/SC 4: Depth profiling

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Edition:

2nd

Published:

03/01/2021

Number of Pages:

20

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1 file

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